Poster Abstract Submittal Deadline Extended to August 15, 2009
The International Symposium on Integrated Ferroelectrics (ISIF) has been held every year since its creation in 1987, initially at two main sites (Colorado Springs and Monterey in the USA), and more recently opened to sites in Europe and Asia.
The ISIF has gathered researchers and engineers from academia, national laboratories, and industry, initially focused on discussing fundamental and applied science of ferroelectric and high-dielectric constant thin films, materials integration, and design and fabrication of advanced devices, such as non-volatile ferroelectric random access memories (FeRAMs), capacitors integrated in high-frequency devices, sensors, microelectromechanical and nanoelectromechanical systems (MEMS/NEMS).
More recently, the ISIF expanded its focus to include the science and technology of other multifunctional materials and their integration, such as multiferroics, magnetic, phase and resistive change, hard (e.g., diamond) and soft (e.g., biomaterials), which integrated with the oxides traditionally addressed in the ISIF, provide a new vision for science and technology of what can be defined as the field of Integrated Functionalities.